Behavior of implanted Xe, Kr and Ar in nanodiamonds and thin graphene stacks: experiment and modeling

Andrey A Shiryaev1, Alexander L Trigub2,3, Ekaterina N Voronina4

  • 1A.N. Frumkin Institute of Physical Chemistry and Electrochemistry RAS, Leninsky pr. 31 korp. 4, 119071, Moscow, Russia. shiryaev@phyche.ac.ru.

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