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Updated: Oct 19, 2025

Aerosol-assisted Chemical Vapor Deposition of Metal Oxide Structures: Zinc Oxide Rods
Published on: September 14, 2017
Surface Zeta Potential of ALD-Grown Metal-Oxide Films
Zijing Xia1,2,3, Vepa Rozyyev2,3,4, Anil U Mane4
1Chemical Sciences and Engineering Division and Center for Molecular Engineering, Argonne National Laboratory, Lemont, Illinois 60439, United States.
Abstract:
Membranes are among the most promising technologies for energy-efficient and highly selective separations, and the surface-charge property of membranes plays a critical role in their broad applications. Atomic layer deposition (ALD) can deposit materials uniformly and with high precision and controllability on arbitrarily complex and large substrates, which renders it a promising method to tune the electrostatics of water/solid interfaces. However, a systematic study of surface-charge properties of ALD-grown films in aqueous environments is still lacking. In this work, 17 ALD-grown metal-oxide films are synthesized, and a comprehensive study of their water stability, wetting properties, and surface-charge properties is provided. This work represents a resource guide for researchers and ultimately for materials and process engineers, seeking to tailor interfacial charge properties of membranes and other porous water treatment components.

