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Sequential ClO2-UV/chlorine process for micropollutant removal and disinfection byproduct control
Mengge Fan1, Xin Yang1, Qingqing Kong1
1School of Environmental Science and Engineering, Guangdong Provincial Key Laboratory of Environmental Pollution Control and Remediation Technology, Sun Yat-sen University, Guangzhou, 510275, China.
Abstract:
This study systematically revealed the feasibility of the sequential ClO2-UV/chlorine process for micropollutant removal and disinfection byproduct (DBP) control. The results demonstrated that the sequential ClO2-UV/chlorine process was effective for the removal of 12 micropollutants. ClO2 pre-treatment reduced the formation of disinfect byproducts (DBPs) in the UV/chlorine process. Compared to the UV/chlorine process, ClO2 pre-treatment (1.0 mg L-1) decreased the formation of the 6 DBPs by 25.1-72.2%; and decreased the formation potential of the 6 DBPs by 13.9-51.8%. Moreover, ClO2 pre-treatment reduced the concentration of total organic chlorine by 19.8%. ClO2 pre-treatment affected the UV/chlorine process in different ways. Firstly, ClO2 pre-treatment generated chlorite, which dominantly served as a scavenger of chlorine radical (Cl) and hydroxyl radical (HO). Secondly, ClO2 pre-treatment decreased the reactivity of natural organic matter (NOM) towards radicals. Finally, ClO2 pre-treatment altered the properties of NOM, in terms of reducing the electron-donating capacity and aromaticity of NOM (SUVA254), and slightly reducing the average molecular weight of NOM. Overall, ClO2 pre-treatment effectively controlled the formation of DBPs in the UV/chlorine process. This study confirmed the sequential ClO2-UV/chlorine process was an alternative strategy to balancing the micropollutant removal and DBP control.
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