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Related Experiment Video

Updated: Oct 19, 2025

Fabrication of Nanopillar-Based Split Ring Resonators for Displacement Current Mediated Resonances in Terahertz Metamaterials
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Capillary-force-induced collapse lithography for controlled plasmonic nanogap structures.

Inki Kim1, Jungho Mun2, Wooseup Hwang3

  • 1Department of Mechanical Engineering, Pohang University of Science and Technology (POSTECH), Pohang, 37673 Republic of Korea.

Microsystems & Nanoengineering
|September 27, 2021
PubMed
Summary

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This summary is machine-generated.

Capillary force-induced collapse lithography (CCL) precisely controls micro/nanostructure collapse. This technique enables the fabrication of sub-10-nm plasmonic nanogap structures for advanced applications like nanosensors.

Area of Science:

  • Micro/nanofabrication
  • Materials science
  • Nanotechnology

Background:

  • Capillary forces significantly impact micro/nanoscale fabrication, often causing undesirable stiction and collapse of structures.
  • Previous methods treated capillary-induced deformation as an uncontrollable obstacle in micro/nanostructure fabrication.

Purpose of the Study:

  • To introduce a novel capillary-force-induced collapse lithography (CCL) technique.
  • To demonstrate the precise control over micro/nanostructure collapse using capillary forces.
  • To achieve sub-10-nm plasmonic nanogap structures for enhanced light focusing.

Main Methods:

  • Utilizing electron-beam lithography in conjunction with controlled capillary forces.
  • Precisely adjusting fabrication parameters like development time, electron dose, and nanopillar geometry.
Keywords:
Micro-opticsNanophotonics and plasmonicsStructural properties

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  • Exploiting the interplay between capillary-force-dominant cohesion and geometry-dominant collapse processes.

    • Main Results:

    • Demonstrated precise control over the collapse of micro/nanostructures.
    • Successfully fabricated various nanopillar shapes through controlled collapse.
    • Achieved sub-10-nm plasmonic nanogap structures with potential for strong light focusing.

    Conclusions:

    • CCL offers a simple and controllable method for fabricating nanostructures.
    • The technique facilitates the creation of essential nanogap structures for plasmonic nanosensors.
    • CCL advances micro/nanofabrication capabilities for optical and sensing applications.