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Directly addressable GaN-based nano-LED arrays: fabrication and electro-optical characterization
Daria D Bezshlyakh1,2, Hendrik Spende1,2,3, Thomas Weimann4
1Institute of Semiconductor Technology, Technische Universität Braunschweig, Hans-Sommer Str. 66, 38106 Braunschweig, Germany.
Microsystems & Nanoengineering
|September 27, 2021
Summary
Researchers developed novel Gallium nitride (GaN) nano-light-emitting diode (LED) arrays for individually controlled microscale light sources. These nanoLEDs enable subwavelength pitch for advanced imaging applications.
Area of Science:
- Materials Science
- Optoelectronics
- Nanotechnology
Background:
- Advancements in display technology drive demand for individually controlled microscale light sources.
- Gallium nitride (GaN) micro-light-emitting diodes (LEDs) show promise but face limitations in fabricating submicron, individually addressable arrays.
Purpose of the Study:
- To present a novel approach for fabricating individually addressable nanoLED arrays with subwavelength pitch.
- To demonstrate the design and fabrication of GaN nanoLEDs for on-chip super-resolution microscopy.
Main Methods:
- Development of nanoLED arrays with direct addressing capabilities.
- Fabrication of two distinct geometries: a 6 × 6 array of 400 nm LEDs and a 2 × 32 line array of 200 nm LEDs.
- Utilizing Gallium nitride (GaN) material properties for nanoLED fabrication.
Main Results:
- Successful fabrication of nanoLED arrays with dimensions below the wavelength of light.
- Demonstrated capability for individual addressing of each nanoLED element.
- GaN nanoLEDs achieved required specifications for integration into super-resolution microscopy.
Conclusions:
- GaN nanoLED arrays offer a viable solution for individually controlled microscale light sources.
- The developed nanoLED technology is suitable for creating novel on-chip super-resolution microscopes.
- GaN's inherent properties make it an ideal platform for advanced nano-optical devices.

