Rapid Degradation of the Electrical Properties of 2D MoS₂ Thin Films under Long-Term Ambient Exposure

The MoS₂ thin film has attracted a lot of attention due to its potential applications in flexible electronics, sensors, catalysis, and heterostructures. Understanding the effect of long-term ambient exposure on the electrical properties of the thin film is important for achieving many overreaching goals of this material. Here, we report for the first time a systematic study of electrical property variation and stability of MoS₂ thin films under ambient exposure of up to a year. The MoS₂ thin films were grown via the sulfurization of 6 nm thick molybdenum films. We found that the resistance of the samples increases by 114% just in 4 weeks and 430% in 4 months and they become fully insulated in a year of ambient exposure. The dual-sweep current-voltage (I-V) characteristic shows hysteretic behavior for a 4-month-old sample which further exhibits pronounced nonlinear I-V curves and hysteretic behavior after 8 months. The X-ray photoelectron spectroscopy measurements show that the MoS₂ thin film gradually oxidizes and 13.1% of MoO₃ and 11.8% oxide of sulfur were formed in 4 months, which further increased to 23.1 and 12.7% in a year, respectively. The oxide of the sulfur peak was not reported in any previous stability studies of exfoliated and chemical vapor deposition-grown MoS₂, suggesting that the origin of this peak is related to the distinct crystallinity of the MoS₂ thin film due to its smaller grain sizes, abundant grain boundaries, and exposed edges. Raman studies show the broadening of E_2g ¹ and A_1g peaks with increasing exposure time, suggesting an increase in the disorder in MoS₂. It is also found that coating the MoS₂ thin film with polymethylmethacrylate can effectively prevent the electrical property degradation, showing only a 6% increase in resistance in 4 months and 40% over a year of ambient exposure.