An Improved P-Type Doped Barrier Surface AlGaN/GaN High Electron Mobility Transistor with High Power-Added Efficiency

Hujun Jia1, Xiaowei Wang1, Mengyu Dong1

  • 1School of Microelectronics, Xidian University, Xi'an 710071, China.

Micromachines
|September 28, 2021
PubMed
Summary

This study introduces an improved P-type doped barrier surface high electron mobility transistor (PDBS-HEMT) that enhances power-added efficiency. The novel design significantly boosts breakdown voltage and RF performance, showing great potential for high energy efficiency applications.

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