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Updated: Oct 17, 2025

Plasma-assisted Molecular Beam Epitaxy of N-polar InAlN-barrier High-electron-mobility Transistors
Published on: November 24, 2016
Effect of lateral diffusion of photoelectrons in the reflection-mode varied-doping AlGaN photocathode on resolution
Abstract:
To obtain a high resolution of the reflection-mode AlGaN photocathode by establishing the modulation transfer function (MTF) model of this photocathode, the influence of emission layer thickness Te, electron diffusion length Ld, recombination velocity at back-interface Vb, and optical absorption coefficient α on MTF for varied-doping and uniform-doping Al0.42Ga0.58N photocathodes have been given. The computational results suggest that varied-doping structure has great potentiality in improving both resolution and quantum efficiency of the reflection-mode Al0.42Ga0.58N photocathode. This improvement is mainly attributed to the reduced lateral diffusion of photoelectrons, which is caused by an electric field generated by the varied-doping structure, and hence the photoelectron transportation towards photocathode surface is promoted.
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