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Imaging Mueller matrix ellipsometry with sub-micron resolution based on back focal plane scanning.
Optics Express
|October 7, 2021
Summary
A novel imaging Mueller matrix ellipsometer (IMME) offers high-precision nanometer measurements for nanotechnology. This advanced instrument achieves 0.8 μm lateral resolution, enabling detailed material characterization.
Area of Science:
- Optical Physics
- Nanotechnology
- Metrology
Background:
- Nanotechnology and nanomaterials demand advanced precision measurement techniques.
- Existing nanometer measurement technologies face limitations in characterizing complex nanoscale features.
Purpose of the Study:
- To develop a new Imaging Mueller Matrix Ellipsometer (IMME) for high-resolution nanoscale metrology.
- To enhance measurement accuracy and lateral resolution for advanced material characterization.
Main Methods:
- Implementation of a back focal plane scanning method for multi-angle incident measurements.
- Development of a two-step calibration procedure to ensure measurement accuracy.
- Utilizing a Hadamard imaging mode to improve imaging contrast over traditional Mueller matrix imaging.
Main Results:
- The IMME operates across wavelengths from 410 nm to 700 nm and incident angles from 0° to 65°.
- Achieved a lateral resolution of 0.8 μm across the entire measurement wavelength range.
- Successfully characterized isotropic and anisotropic samples with micron-scale lateral distribution and nano-scale vertical thickness.
Conclusions:
- The developed IMME provides high lateral resolution and precision ellipsometric measurements.
- The instrument is capable of characterizing complex nanoscale material features, including optical anisotropy.
- This technology addresses the metrology challenges posed by advancements in nanotechnology and nanomaterials.
