Related Experiment Video
Updated: Oct 17, 2025
The Effect of Anodization Parameters on the Aluminum Oxide Dielectric Layer of Thin-Film Transistors
Published on: May 24, 2020
Parameter Optimization of Laser Direct-Write Patterning on Indium Tin Oxide/Polycarbonate Thin Films Using
Yi-Cheng Chen1, Yi-Kai Hsiung1, Chih-Yuan Chang1
1Department of Mold and Die Engineering, National Kaohsiung University of Science and Technology, Kaohsiung 807618, Taiwan.
Abstract:
Indium tin oxide (ITO) thin films on polycarbonate (PC) substrates were patterned using the laser direct-write (LDW) technique to form an isolation line. The effect of the LDW parameters (power, pulse repetition rate, and defocusing distance) on the isolation line width, depth and roughness of the PC within the line was investigated. Additionally, the Taguchi method of experimental design was applied to determine the optimal parameters of LDW. Results showed that increasing the power led to an increase in the isolation line width and decrease in the surface roughness of the PC within the line. The increase in the pulse repetition rate and defocusing distance caused a decrease in the isolation line width. The optimal parameters were found to be A2B3C3, consisting of power of 5 W, pulse repetition rate of 100 kHz, and defocusing distance of +3 mm. Under these parameters, we obtained an isolation line width of 48.4 μm, and a surface roughness of Ra 38 nm of the PC within the isolation line. We confirmed that the ITO films separated by the isolation lines attained electrical isolation.
