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A Standard and Reliable Method to Fabricate Two-Dimensional Nanoelectronics
Published on: August 28, 2018
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Wafer-scale functional circuits based on two dimensional semiconductors with fabrication optimized by machine
Xinyu Chen1, Yufeng Xie1, Yaochen Sheng1
1State Key Laboratory of ASIC and System, School of Microelectronics, Fudan University, Shanghai, 200433, P. R. China.
Nature Communications
|October 13, 2021
Summary
Machine learning optimizes molybdenum disulfide (MoS2) field-effect transistor fabrication for industrial applications. This breakthrough enables wafer-scale production of advanced electronic circuits beyond silicon.
Area of Science:
- Materials Science
- Nanotechnology
- Electrical Engineering
Background:
- Two-dimensional layered materials (2DLMs), inspired by graphene, show promise but face challenges in high-quality growth and industrial integration.
- Existing fabrication methods for 2DLMs like molybdenum disulfide (MoS2) do not meet industrial standards for electronic devices.
Purpose of the Study:
- To overcome challenges in 2DLM fabrication and integration using machine learning (ML).
- To co-optimize the electrical characteristics of MoS2 top-gated field-effect transistors (FETs) for improved device performance.
Main Methods:
- Utilized ML algorithms to identify critical process parameters affecting MoS2 FET electrical properties.
- Employed ML combined with grid searching for wafer-scale fabrication optimization.
- Developed 62-level SPICE models for MoS2 FETs to simulate circuit behavior.
Main Results:
- Achieved co-optimization of key device parameters including mobility, threshold voltage, and subthreshold swing.
- Successfully constructed functional digital, analog, and photodetection circuits using ML-optimized MoS2 FETs.
- Demonstrated wafer-scale test FET arrays and a 4-bit full adder using industry-standard processes.
Conclusions:
- ML-assisted fabrication optimization is a viable strategy for advancing beyond-silicon electronic materials.
- The study validates the potential of ML for high-quality, wafer-scale production of 2DLM-based electronic devices.
- Results pave the way for the industrial application of MoS2 and other 2DLMs in next-generation electronics.

