Semiconductors
Biasing of Metal-Semiconductor Junctions
Measurements of Strain
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Electron Channeling Contrast Imaging for Rapid III-V Heteroepitaxial Characterization
Published on: July 17, 2015
Leila Balaghi1,2, Si Shan1, Ivan Fotev1,2
1Institute of Ion Beam Physics and Materials Research, Helmholtz-Zentrum Dresden-Rossendorf, 01328, Dresden, Germany.
Strain engineering in semiconductor nanowires significantly boosts electron mobility. This advancement in gallium arsenide nanowires offers a unique pathway for next-generation transistor technology.
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