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Correction of PZT scanner errors using a phase compensation method in white-light phase-shifting interferometry
Applied Optics
|November 22, 2021
Summary
This study introduces a new method to correct phase errors in white-light phase-shifting interferometry (WLPSI) caused by scanner movement. The compensated peak detection and modified bucket algorithm improves measurement accuracy and repeatability for surface profiling.
Area of Science:
- Optical metrology
- Surface characterization
- Manufacturing process control
Background:
- White-light phase-shifting interferometry (WLPSI) is crucial for surface profiling in industries like LCD and semiconductor manufacturing.
- Scanner movement irregularities introduce phase errors, degrading measurement accuracy and stability in WLPSI.
- Complete elimination of mechanical and electrical delays in scanner systems is challenging.
Purpose of the Study:
- To propose a novel method for correcting phase errors in WLPSI stemming from nonlinear scanner motion.
- To enhance the measurement accuracy and repeatability of WLPSI systems.
- To address the limitations of conventional phase correction techniques.
Main Methods:
- Development of a scanner position tracking system.
- Implementation of a phase correction algorithm: compensated peak detection and modified bucket algorithm.
- Experimental verification of the proposed method against conventional approaches.
Main Results:
- The proposed method effectively compensates for phase errors caused by irregular scanner movement.
- Experimental results demonstrate superior performance compared to traditional phase correction techniques.
- Significant improvements in both measurement accuracy and repeatability were achieved.
Conclusions:
- The novel scanner position tracking and phase correction method offers a robust solution for WLPSI.
- This technique enhances the reliability of surface profiling in demanding manufacturing environments.
- The compensated peak detection and modified bucket algorithm represents a significant advancement in optical metrology.
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