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Improving the Performance of the ToGoFET Probe: Advances in Design, Fabrication, and Signal Processing
Hoontaek Lee1, Junsoo Kim1, Kumjae Shin2
1Department of Mechanical Engineering, Phohang University of Science and Technology (POSTECH), Pohang-si 37673, Korea.
Abstract:
We report recent improvements of the tip-on-gate of field-effect-transistor (ToGoFET) probe used for capacitive measurement. Probe structure, fabrication, and signal processing were modified. The inbuilt metal-oxide-semiconductor field-effect-transistor (MOSFET) was redesigned to ensure reliable probe operation. Fabrication was based on the standard complementary metal-oxide-semiconductor (CMOS) process, and trench formation and the channel definition were modified. Demodulation of the amplitude-modulated drain current was varied, enhancing the signal-to-noise ratio. The I-V characteristics of the inbuilt MOSFET reflect the design and fabrication modifications, and measurement of a buried electrode revealed improved ToGoFET imaging performance. The minimum measurable value was enhanced 20-fold.
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