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Updated: Oct 10, 2025

Ohmic Contact Fabrication Using a Focused-ion Beam Technique and Electrical Characterization for Layer Semiconductor Nanostructures
Published on: December 5, 2015
The chiral coating on an achiral nanostructure by the secondary effect in focused ion beam induced deposition
Chen Fang1, Qing Chai1, Ye Chen1
1Jiangsu Key Laboratory for Design and Manufacture of Micro-Nano Biomedical Instruments, Department of Mechanical Engineering, Southeast University, Nanjing, People's Republic of China.
Abstract:
Optical metamaterials are widely used in electromagnetic wave modulation due to their sub-wavelength feature sizes. In this paper, a method to plate an achiral nanopillar array with chiral coating by the secondary effect in focused ion beam induced deposition is proposed. Guided by the pattern defined in a bitmap with variable residence time, the beam scan strategy suppresses the interaction between adjacent nanostructures. A uniform chiral coating is formed on the target nanostructure without affecting the adjacent nanostructure, under carefully selected beam parameters and the rotation angle of the sample stage. Energy dispersive x-ray spectroscopy results show that the chiral film has high purity metal, which enables the generation of localized surface plasmon resonances and causes the circular dichroism (CD) under circularly polarized light illumination. Finally, the tailorable CD spectrum of the coated array is verified by the finite difference time domain method.

