Piezoelectricity in hafnia
Sangita Dutta1,2, Pratyush Buragohain3, Sebastjan Glinsek4
1Materials Research and Technology Department, Luxembourg Institute of Science and Technology, 5 avenue des Hauts-Fourneaux, L-4362, Esch/Alzette, Luxembourg. sangita.dutta@list.lu.
Hafnia (HfO2) exhibits a unique negative piezoelectric effect, confirmed by simulations and experiments. This property, linked to oxygen coordination, can be tuned by controlling the material's environment, opening new avenues for electronic applications.
Area of Science:
- Materials Science
- Solid State Physics
- Nanotechnology
Background:
- Hafnia (HfO2) is a leading ferroelectric material for semiconductor technologies.
- Its ferroic and electromechanical properties, particularly the piezoelectric response, are not fully understood.
- HfO2 is predicted to exhibit a negative longitudinal piezoelectric effect, unlike conventional ferroelectrics.
Purpose of the Study:
- To experimentally and theoretically investigate the negative longitudinal piezoelectric effect in HfO2.
- To elucidate the role of chemical coordination in this unique electromechanical behavior.
- To explore methods for tuning the piezoelectric response of HfO2.
Main Methods:
- First-principles calculations were employed to simulate material behavior.
- Experimental validation was performed on HfO2 thin films using piezoresponse force microscopy.
- Analysis focused on the chemical coordination of oxygen atoms and the impact of epitaxial strain.
Main Results:
- The study confirms the negative longitudinal piezoelectric effect in HfO2.
- Simulations identified the chemical coordination of oxygen atoms as the origin of this effect.
- The sign of the piezoelectric response can be modulated by controlling the oxygen environment, for instance, via epitaxial strain.
Conclusions:
- Hafnia (HfO2) displays a distinct negative longitudinal piezoelectric effect.
- The phenomenon is intrinsically linked to the local chemical environment of oxygen atoms.
- Tailoring the material's environment offers a pathway to control and engineer HfO2's piezoelectric properties for advanced electronics.
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