Non-ohmic Devices
Insensitive Nuclei Enhanced by Polarization Transfer (INEPT)
You might also read
Articles linked to this work by shared authors, journal, and citation graph.
Updated: Oct 8, 2025

Niobium Oxide Films Deposited by Reactive Sputtering: Effect of Oxygen Flow Rate
Published on: September 28, 2019
Po-Hsun Chen1,2, Chih-Yang Lin3, Ting-Chang Chang3,4
1Department of Applied Science, R.O.C. Naval Academy, No. 669 Junxiao Road, Kaohsiung 81345, Taiwan.
Niobium oxide (NbO) devices show promise for neuromorphic computing by reducing leakage current. This study explains an abnormal reset phenomenon and achieves fast switching speeds for advanced memory applications.
Area of Science:
Background:
Purpose of the Study:
Main Methods:
Main Results:
Conclusions: