g-C₃N₄: Properties, Pore Modifications, and Photocatalytic Applications

Graphitic carbon nitride (g-C₃N₄), as a polymeric semiconductor, is promising for ecological and economical photocatalytic applications because of its suitable electronic structures, together with the low cost, facile preparation, and metal-free feature. By modifying porous g-C₃N₄, its photoelectric behaviors could be facilitated with transport channels for photogenerated carriers, reactive substances, and abundant active sites for redox reactions, thus further improving photocatalytic performance. There are three types of methods to modify the pore structure of g-C₃N₄: hard-template method, soft-template method, and template-free method. Among them, the hard-template method may produce uniform and tunable pores, but requires toxic and environmentally hazardous chemicals to remove the template. In comparison, the soft templates could be removed at high temperatures during the preparation process without any additional steps. However, the soft-template method cannot strictly control the size and morphology of the pores, so prepared samples are not as orderly as the hard-template method. The template-free method does not involve any template, and the pore structure can be formed by designing precursors and exfoliation from bulk g-C₃N₄ (BCN). Without template support, there was no significant improvement in specific surface area (SSA). In this review, we first demonstrate the impact of pore structure on photoelectric performance. We then discuss pore modification methods, emphasizing comparison of their advantages and disadvantages. Each method's changing trend and development direction is also summarized in combination with the commonly used functional modification methods. Furthermore, we introduce the application prospects of porous g-C₃N₄ in the subsequent studies. Overall, porous g-C₃N₄ as an excellent photocatalyst has a huge development space in photocatalysis in the future.