Sputtering onto liquids: a critical review

Area of Science:

• Materials Science
• Nanotechnology
• Physical Chemistry

Background:

• Sputter deposition is a physical vapor deposition technique.
• Colloidal synthesis produces nanoparticles in solution.
• Combining these methods offers advantages for nanoparticle production.

Purpose of the Study:

• To provide a critical analysis of nanoparticle synthesis via sputter deposition onto liquid substrates.
• To review the influence of sputtering parameters and liquid properties on nanoparticle formation.
• To offer a detailed overview of the properties and applications of produced nanoparticles.

Main Methods:

• Review of over 132 scientific papers published between 1996 and September 2021.
• Analysis of magnetron sputter deposition basics and nanoparticle formation in solution.
• Critical evaluation of experimental data concerning sputtering parameters and liquid properties.

Main Results:

• Sputtering parameters (power, current, voltage, time, gas pressure, plasma type) significantly influence nanoparticle formation.
• Host liquid properties (composition, temperature, viscosity, surface tension) also critically affect nanoparticle synthesis.
• Ultrapure, monodisperse nanoparticles can be produced with controlled properties.

Conclusions:

• Sputter deposition onto liquid substrates is a viable method for producing high-quality nanoparticles.
• Understanding the interplay between sputtering conditions and liquid environment is key to optimizing nanoparticle synthesis.
• The produced nanoparticles exhibit diverse properties and find applications in various fields.