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Multi-Bandgap Monolithic Metal Nanowire Percolation Network Sensor Integration by Reversible Selective Laser-Induced
Junhyuk Bang1, Yeongju Jung1, Hyungjun Kim2
1Applied Nano and Thermal Science Lab, Department of Mechanical Engineering, Seoul National University, 1 Gwanak-ro, Gwanak-gu, Seoul, 151-742, Republic of Korea.
Nano-Micro Letters
|January 25, 2022
Summary
Researchers developed a novel laser-based method to create seamless active electronic components, eliminating problematic semiconductor-metal interfaces. This technique allows for tunable bandgaps, enabling multifunctional devices like multispectral photodetectors.
Area of Science:
- Materials Science
- Nanotechnology
- Electronics Engineering
Background:
- Conventional active electronics rely on semiconductor-metal interfaces, prone to electrical and mechanical failures.
- Current fabrication methods like photolithography involve multiple steps and create defective interfaces.
Purpose of the Study:
- To develop a novel fabrication method for seamless active electronic components.
- To eliminate semiconductor-metal interfaces in electronic devices.
- To enable multifunctional electronic devices with tunable properties.
Main Methods:
- Developed a reversible selective laser-induced redox (rSLIR) method.
- Utilized laser light to control the oxidation state of copper (Cu) to form Cu2O and CuO.
- Fabricated monolithic metal-semiconductor-metal multispectral photodetectors.
Main Results:
- Achieved seamless integration of copper (Cu), copper(I) oxide (Cu2O), and copper(II) oxide (CuO) from a single material.
- Demonstrated reversible control over oxidation states and bandgaps (2.1 eV for Cu2O, 1.2 eV for CuO) using laser light.
- Successfully fabricated a flexible monolithic multispectral photodetector capable of detecting multiple wavelengths.
Conclusions:
- The rSLIR method offers a novel approach to fabricating active electronic components without defective interfaces.
- This technique enables the creation of multifunctional sensors and devices with tunable bandgaps.
- rSLIR presents a next-generation fabrication method for electronics, overcoming limitations of conventional photolithography.
