MOSFET: Enhancement Mode
Biasing of Metal-Semiconductor Junctions
Biasing of P-N Junction
MOSFET
Switching of BJT
Metal-Semiconductor Junctions
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Updated: Oct 4, 2025

Silicon Metal-oxide-semiconductor Quantum Dots for Single-electron Pumping
Published on: June 3, 2015
Chongbiao Luan1, Hongwei Liu1, Xun Ma1
1Key Laboratory of Pulsed Power, Institute of Fluid Physics, China Academy of Engineering Physics, P.O. Box 919-108, Mianyang 621900, China.
A new pulsed current injection source was developed to study transient electromagnetic pulse damage to electronic equipment cables. This device helps understand protection mechanisms against electromagnetic interference.
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