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Probing borophene oxidation at the atomic scale.
Xiaolong Liu1, Matthew S Rahn2, Qiyuan Ruan3
1Applied Physics Graduate Program, Northwestern University, Evanston, IL, 60208, United States of America.
Nanotechnology
|February 18, 2022
Summary
Borophene degrades instantly in air but oxidizes controllably with molecular oxygen in ultrahigh vacuum (UHV). This study reveals atomic mechanisms of borophene oxidation, crucial for its use in nanoelectronics.
Area of Science:
- Materials Science
- Surface Science
- Nanotechnology
Background:
- Two-dimensional boron, or borophene, is a promising material for nanoelectronic and quantum technologies.
- Borophene synthesis requires ultrahigh vacuum (UHV), necessitating understanding its stability in oxidizing environments for practical applications.
Purpose of the Study:
- To investigate the oxidation mechanism of borophene upon exposure to air and molecular oxygen in UHV.
- To provide atomic-scale insights into borophene's chemical stability and structural integrity under oxidative conditions.
Main Methods:
- Scanning tunneling microscopy and spectroscopy (STM/STS)
- X-ray photoelectron spectroscopy (XPS)
- Density functional theory (DFT) calculations
Main Results:
- Borophene degrades almost instantaneously when exposed to air.
- Controlled oxidation occurs with molecular oxygen in UHV, leading to single-atom covalent modification of the basal plane.
- Borophene edges undergo disordered oxidation with altered electronic properties.
Conclusions:
- Atomic-scale understanding of borophene oxidation pathways, including oxygen dissociation, diffusion, and chemisorption, was achieved.
- Findings are critical for developing passivation strategies and enabling ambient applications of borophene.
- This research informs the practical utilization of borophene in nanoelectronic and quantum technologies.
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