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Updated: Oct 2, 2025

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Investigation of SiO2 Etch Characteristics by C6F6/Ar/O2 Plasmas Generated Using Inductively Coupled Plasma and

Dain Sung1, Long Wen1, Hyunwoo Tak1

  • 1Department of Advanced Materials Science and Engineering, Sungkyunkwan University, Suwon 16419, Korea.

Materials (Basel, Switzerland)
|February 25, 2022
PubMed

Keywords:
C6F6L-FCcapacitively coupled plasma (CCP)high aspect ratio contact (HARC)inductively coupled plasma (ICP)liquid fluorocarbon (PFC)plasma etching

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Inductively coupled plasma (ICP) is the most widely used plasma source in atomic emission spectroscopy (AES), also known as Inductively Coupled Plasma Optical Emission Spectroscopy (ICP-OES). The ICP source, or torch, consists of three concentric quartz tubes with argon gas flowing through them. A spark from a Tesla coil initiates the ionization of argon, generating a high-temperature plasma.
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