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Related Concept Videos

Atomic Force Microscopy01:08

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Atomic force microscopy (AFM) is a type of scanning probe microscopy that can analyze topographic details of various specimens like ceramics, glass, polymers, and biological samples. AFM offers over 1000 times more resolution than the optical imaging system. Images generated from AFM are three-dimensional surface profiles, offering an advantage over the flat, two-dimensional images from other imaging techniques.
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The early pioneers of microscopy opened a window into the invisible world of microorganisms. In 1830, Joseph Jackson Lister created an essentially modern light microscope. The 20th century saw the development of microscopes that leveraged nonvisible light, such as fluorescence microscopy that uses an ultraviolet light source and electron microscopy that uses short-wavelength electron beams. These advances significantly improved magnification, image resolution, and contrast. By comparison, the...
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Super-resolution fluorescence microscopy (SRFM) provides a better resolution than conventional fluorescence microscopy by reducing the point spread function (PSF). PSF is the light intensity distribution from a point that causes it to appear blurred. Due to PSF, each fluorescing point appears bigger than its actual size, and it is the PSF interference of nearby fluorophores that causes the blurred image. Various approaches to achieving higher resolution through SRFM have recently been...
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Related Experiment Video

Updated: Oct 2, 2025

Author Spotlight: Introduction to Active Probe Atomic Force Microscopy with Quattro-Parallel Cantilever Arrays
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Correlative AFM and Scanning Microlens Microscopy for Time-Efficient Multiscale Imaging.

Tianyao Zhang1,2,3, Haibo Yu1,2, Jialin Shi1,2

  • 1State Key Laboratory of Robotics, Shenyang Institute of Automation, Chinese Academy of Sciences, Shenyang, 110016, P. R. China.

Advanced Science (Weinheim, Baden-Wurttemberg, Germany)
|February 28, 2022
PubMed
Summary
This summary is machine-generated.

This study introduces a new nondestructive imaging method combining atomic force microscopy (AFM) with microlens scanning optical microscopy. This technique enhances integrated circuit inspection by enabling rapid, high-resolution imaging across multiple scales.

Keywords:
atomic force microscopy (AFM)correlative microscopymicrolensmicrosphereoptical imaging

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Area of Science:

  • Materials Science
  • Nanotechnology
  • Optical Engineering

Background:

  • Microelectronics and nanofabrication are driving integrated circuit feature sizes to the nanoscale.
  • Conventional microscopy struggles to provide both rapid imaging and nanoscale resolution for circuit inspection.
  • There is a critical need for improved quality and efficiency in integrated circuit inspection.

Purpose of the Study:

  • To propose a nondestructive, high-throughput, multiscale correlation imaging method for integrated circuit inspection.
  • To bridge the resolution gap between traditional optical imaging and atomic force microscopy (AFM).
  • To enable nanoscale-level correlation between optical images and structural information for semiconductor device inspection.

Main Methods:

  • Combines atomic force microscopy (AFM) with microlens-based scanning optical microscopy.
  • Integrates a microlens with a focused ion beam deposited tip onto an AFM cantilever.
  • Utilizes a multiscale correlation imaging approach for enhanced resolution and throughput.

Main Results:

  • Achieves a 3-4× increase in optical imaging magnification.
  • Improves scanning imaging throughput by approximately 8×.
  • Enables rapid imaging from micrometer to nanometer resolution.

Conclusions:

  • The proposed method offers a powerful tool for efficient, large-scale semiconductor device inspection.
  • It provides simultaneous nanoscale correlation between optical images and structural data.
  • This approach overcomes limitations of conventional microscopy for nanoscale integrated circuit analysis.