Single-shot wide-field topography measurement using spectrally multiplexed reflection intensity holography via...

Surface topology measurements of micro- or nanostructures are essential for both scientific and industrial applications. However, high-throughput measurements remain challenging in surface metrology. We present single-shot full-field surface topography measurement using Kramers-Kronig holographic imaging and spectral multiplexing. Three different intensity images at different incident angles were simultaneously measured with three different colors, from which a quantitative phase image was retrieved using spatial Kramers-Kronig relations. A high-resolution topographic image of the sample was then reconstructed using synthetic aperture holography. Various patterned structures at the nanometer scale were measured and cross-validated using atomic force microscopy.