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λ/30 inorganic features achieved by multi-photon 3D lithography.

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Femtosecond laser direct writing enables high-resolution, 3D inorganic feature fabrication using hydrogen silsesquioxane. This super-diffraction limit photolithography achieves nanoscale resolution for advanced micro-nano devices.

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Area of Science:

  • Materials Science
  • Nanotechnology
  • Photolithography

Background:

  • Hydrogen silsesquioxane (HSQ) is an inorganic photoresist suitable for high-resolution patterning.
  • Conventional patterning methods using EUV and electron beams face limitations for 3D nanoscale feature fabrication with infrared light.

Purpose of the Study:

  • To demonstrate the fabrication of 3D nanoscale inorganic features using femtosecond laser direct writing (FsLDW) of HSQ.
  • To achieve super-diffraction limit resolution for HSQ patterning using infrared light.

Main Methods:

  • Femtosecond laser direct writing (FsLDW) utilizing a multi-photon absorption process.
  • Patterning of hydrogen silsesquioxane (HSQ) with a 780 nm femtosecond laser.

Main Results:

  • Achieved a feature size of 26 nm, representing a resolution of λ/30 (super-diffraction limit photolithography).
  • Fabricated HSQ microstructures with nanoscale resolution, smooth surfaces, and thermal stability up to 600°C.
  • Demonstrated the construction of structural color and Fresnel lenses with desirable optical properties and resistance.

Conclusions:

  • FsLDW of HSQ offers a flexible method for creating inorganic features with nanoscale resolution.
  • The fabricated microstructures exhibit excellent thermal and chemical resistance.
  • This technique holds promise for fabricating advanced micro-nano devices requiring high resolution and material robustness.