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Optimization of Feedback FET with Asymmetric Source Drain Doping Profile
Inyoung Lee1, Hyojin Park1, Quan The Nguyen1
1Department of Electronic Engineering, Myongji University, Yongin-si 17058, Gyeonggi-do, Korea.
Abstract:
A feedback field-effect transistor (FBFET) is a novel device that uses a positive feedback mechanism. FBFET has a high on-/off ratio and is expected to realize ideal switching characteristics through steep changes from off-state to on-state. In this paper, we propose and optimize FBFET devices with asymmetric source/drain doping concentrations. Additionally, we discuss the changes in electrical characteristics across various channel length and channel thickness conditions and compare them with those of FBFET with a symmetric source/drain. This shows that FBFET with an asymmetric source/drain has a higher on-/off ratio than FBFET with a symmetric source/drain.
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