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A 3D-printed Chamber for Organic Optoelectronic Device Degradation Testing

A 3D-printed Chamber for Organic Optoelectronic Device Degradation Testing

Published on: August 10, 2018

Advanced Temperature-Control Chamber for Resistance Standards.

Shamith U Payagala¹, Alireza R Panna¹, Albert F Rigosi¹

¹National Institute of Standards and Technology,Gaithersburg, MD 20899, USA.

Journal of Research of the National Institute of Standards and Technology

|April 25, 2022

Summary

New temperature-control chambers enhance resistance metrology by providing stable environments for standard resistors. This advancement improves measurement accuracy and efficiency in metrology calibration services.

Keywords:

air-flow simulations measurement standard resistor temperature-control chamber

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Area of Science:

Electrical Metrology
Thermodynamics
Instrumentation Engineering

Background:

Standard resistors are crucial for resistance metrology.
Current methods face limitations in simultaneous measurements and environmental temperature stability.
Advancements are needed to overcome these limitations.

Purpose of the Study:

To design and develop a precise temperature-control chamber for standard resistors.
To achieve a highly stable, constant-temperature environment.
To improve the efficiency and reduce recovery times of the chamber.

Main Methods:

Customizing chamber design using air-flow simulations.
Optimizing airflow in an unsealed configuration via microprocessor programming.
Conducting tests to enhance control system stability and chamber efficiency.

Main Results:

Developed a precise temperature-control chamber for standard resistors.
Achieved a constant-temperature environment with a stability of ± 6 m°C.
Reduced chamber temperature recovery times through optimized airflow.

Conclusions:

The developed temperature-control chamber offers a stable environment for resistance metrology.
Customized design and optimized airflow significantly improve performance.
This advancement addresses limitations in current calibration methods.