Related Experiment Video
Updated: Sep 25, 2025

An Atmospheric Pressure Plasma Setup to Investigate the Reactive Species Formation
Published on: November 3, 2016
Gas/Liquid Pulsed Discharge Plasma in a Slug Flow Reactor under Pressurized Argon for Dye Decomposition
Wanying Zhu1, Wahyudiono1, Hideki Kanda1
1Department of Materials Process Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan.
Investigating gas/liquid discharge plasma under pressurized argon revealed that increasing system pressure reduces methylene blue decomposition. Higher pressures also increase total oxidation species due to energy loss.
Area of Science:
- Plasma Science
- Chemical Engineering
- Environmental Chemistry
Background:
- Pulsed discharge plasma in gas/liquid environments offers low energy requirements and high reactivity.
- Previous work established a slug flow system for atmospheric pressure gas/liquid plasma.
- High-pressure plasma research shows promising results.
Purpose of the Study:
- Implement a slug flow system for gas/liquid discharge plasma under pressurized argon.
- Investigate the effect of system pressure (0.1–0.4 MPa) on plasma characteristics and reactivity.
- Apply the pressurized system to methylene blue decomposition and analyze chemical reactivity and energy.
Main Methods:
- Utilized a slug flow system for gas/liquid plasma generation.
- Controlled system pressure from 0.1 MPa (atmospheric) to 0.4 MPa.
- Applied the plasma system to degrade methylene blue and measured oxidation species.
Main Results:
- Methylene blue decomposition rate decreased with increasing system pressure.
- Concentration of total oxidation species increased as system pressure rose.
- Energy available for decomposition decreased due to steady input energy and increased energy loss.
Conclusions:
- System pressure significantly impacts gas/liquid plasma efficiency for pollutant degradation.
- Increased pressure leads to reduced degradation efficiency but higher overall oxidation species generation.
- Optimizing pressure is crucial for effective plasma-based chemical treatment applications.
More Related Videos
08:18Synthesis and Characterization of High c-axis ZnO Thin Film by Plasma Enhanced Chemical Vapor Deposition System and its UV Photodetector Application
Published on: October 3, 2015
09:27Encapsulation and Permeability Characteristics of Plasma Polymerized Hollow Particles
Published on: August 16, 2012
Related Concept Videos
Inductively Coupled Plasma Atomic Emission Spectroscopy: Principle
The ions and electrons produced interact with the fluctuating magnetic field created by a water-cooled...
Atomic Emission Spectroscopy: Overview