Highly Sensitive Photopolymer for Holographic Data Storage Containing Methacryl Polyhedral Oligomeric Silsesquioxane

Herein, via introducing eight methacryl polyhedral oligomeric silsesquioxane (Ma-POSS), we dramatically enhance the holographic performance of phenanthraquinone-doped poly(methyl methacrylate) (PQ/PMMA) photopolymer with excellent characteristics of high sensitivity, high diffraction efficiency, and neglectable volume shrinkage for holographic data storage, the photosensitivity, diffraction efficiency, and volume shrinkage reaching 1.47 cm/J, ∼75%, and ∼0.09%, respectively. Ma-POSS here dramatically enhances the photosensitivity ∼5.5 times, diffraction efficiency more than 50%, and suppressed the volume shrinkage over 4 times. Further analysis reveals that Ma-POSS obviously increased the molecular weight by grafting PMMA to be a star-shaped macromolecule. And the residual C═C of POSS-PMMA dramatically increased the photosensitivity. Moreover, the star-shaped POSS-PMMA acting as a plasticizer dramatically enhances the mechanical properties and so reduces the photoinduced volume shrinkage of PQ/PMMA. Finally, by the use of the POSS-PMMA/PQ in a collinear holography system, it appeared to be promising for a fast but low bit error rate in holographic information storage. The current study thence has not only successfully synthesized photopolymer materials with potential for highly sensitive holographic storage applications but also investigated the microphysical mechanism of the impact of Ma-POSS on the holographic properties of PQ/PMMA photopolymer and clarified the thermal- and photoreaction processes of the POSS-PMMA/PQ photopolymer.