Ion beam composition in ion source based on magnetron sputtering discharge at extremely low working pressure

Area of Science:

• Plasma physics
• Ion source technology
• Surface science

Background:

• Pulsed planar magnetron sputtering discharges typically require a minimum gas pressure for stable operation.
• The fraction of metal ions in the ion beam decreases as gas pressure is reduced in conventional magnetron sputtering.

Purpose of the Study:

• To investigate stable operation of pulsed magnetron sputtering at extremely low pressures.
• To analyze the effect of a supplementary vacuum arc plasma injector on ion beam composition.
• To determine the pressure dependence of gaseous ion fraction under novel operating conditions.

Main Methods:

• Utilized a pulsed planar magnetron sputtering discharge.
• Employed a supplementary vacuum arc plasma injector.
• Operated the system at extremely low pressures without gas feed.
• Analyzed ion beam composition and pressure dependence of ion fractions.

Main Results:

• Achieved stable operation of the magnetron sputtering discharge at extremely low pressures using the plasma injector.
• Observed that the gaseous ion fraction exhibits a non-monotonic dependence on pressure under these conditions.
• Demonstrated stable magnetron sputtering operation without gas feed.

Conclusions:

• Supplementary vacuum arc plasma injection enables stable, gas-feed-free magnetron sputtering at ultra-low pressures.
• The non-monotonic pressure dependence of gaseous ion fraction indicates a complex plasma interaction mechanism.
• This technique offers new possibilities for controlling ion beam composition in sputtering sources.