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Preparation of Large-area Vertical 2D Crystal Hetero-structures Through the Sulfurization of Transition Metal Films for Device Fabrication
Published on: November 28, 2017
Effect of interfacial defects on the electronic properties of MoS2 based lateral T-H heterophase junctions
Mohammad Bahmani1, Mahdi Ghorbani-Asl2, Thomas Frauenheim3,4,5
1Bremen Center for Computational Materials Science (BCCMS), Department of Physics, Bremen University 28359 Bremen Germany mbahmani@uni/bremen.de +49 421 21862338.
Abstract:
The coexistence of semiconducting (2H) and metallic (1T) phases of MoS2 monolayers has further pushed their strong potential for applications in the next generation of electronic devices based on two-dimensional lateral heterojunctions. Structural defects have considerable effects on the properties of these 2D devices. In particular, the interfaces of two phases are often imperfect and may contain numerous vacancies created by phase engineering techniques, e.g. under an electron beam. Here, the transport behaviors of the heterojunctions with the existence of point defects are explored by means of first-principles calculations and non-equilibrium Green's function approach. While vacancies in semiconducting MoS2 act as scattering centers, their presence at the interface improves the flow of the charge carriers. In the case of VMo, the current has been increased by two orders of magnitude in comparison to the perfect device. The enhancement of transmission was explained by changes in the electronic densities at the T-H interface, which open new transport channels for electron conduction.
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