Mechano-fluorochromic behavior of AEE polyurethane films and their high sensitivity to halogen acid gas
Kun Wang1, Meng Wang1, Hao Lu1
1Key Laboratory of Aerospace Advanced Materials and Performance, Ministry of Education, School of Materials Science and Engineering, Beihang University Beijing 100191 China jyang@buaa.edu.cn.
Abstract:
Three polyurethanes with different contents of tetraaryl-buta-1,3-diene derivatives in the soft segment (STMPU-25/STMPU-50/STMPU-75) have been synthesized and found to present aggregation-enhanced emission features. The fluorescence intensity of polymer films was greatly enhanced with increasing tensile stress. Also, polyurethanes with higher aggregation-induced emission fluorogen content had stronger mechano-fluorochromic behavior in the same tension state. Moreover, the resulting polyurethane films possessed high sensitivity for halogen acid gas, suggesting their potential applications in environmental monitoring fields.
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