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Updated: Sep 23, 2025

Graphene-Assisted Quasi-van der Waals Epitaxy of AlN Film on Nano-Patterned Sapphire Substrate for Ultraviolet Light Emitting Diodes
Published on: June 25, 2020
Improved carrier injection of AlGaN-based deep ultraviolet light emitting diodes with graded superlattice electron
Byeongchan So1, Jinwan Kim1, Taemyung Kwak1
1Convergence Center for Advanced Nano Semiconductor (CANS), Department of Nano-optical Engineering, Korea Polytechnic University 237 Sangidaehak-ro Siheung-si Gyeonggi-do South Korea ohnam@kpu.ac.kr +82 31 8041 0917 +82 31 8041 0710.
Abstract:
A DUV-LED with a graded superlattice electron blocking layer (GSL-EBL) is demonstrated to show improved carrier injection into the multi-quantum well region. The structures of modified EBLs are designed via simulation. The simulation results show the carrier behavior mechanism of DUV-LEDs with a single EBL (S-EBL), graded EBL (G-EBL), and GSL-EBL. The variation in the energy band diagram around the EBL region indicates that the introduction of GSL-EBL is very effective in enhancing carrier injection. Besides, all DUV-LEDs emitting at 280 nm are grown in the high temperature metal organic chemical deposition system. It is confirmed that the optical power of the DUV-LED with the GSL-EBL is significantly higher than that of the DUV-LED with the S-EBL and G-EBL.
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