Related Experiment Video
Updated: Sep 23, 2025

07:42
Inkjet Printing All Inorganic Halide Perovskite Inks for Photovoltaic Applications
Published on: January 22, 2019
11.2K
High-Resolution Patterning of Organic Emitting-Layer by Using Inkjet Printing and Sublimation Transfer Process
Jun Yeub Lee1,2, Byeong-Kwon Ju2, Kwan Hyun Cho1
1Digital Transformation R&D Department, Korea Institute of Industrial Technology, Ansan-si 15588, Gyeonggi-do, Korea.
Nanomaterials (Basel, Switzerland)
|May 14, 2022
Summary
Researchers achieved ultra-high resolution 2822 pixels-per-inch (PPI) patterns using inkjet printing and vacuum drying. This novel method successfully fabricated void-free microchannels, overcoming challenges in thin film morphology control.
Area of Science:
- Materials Science
- Nanotechnology
- Additive Manufacturing
Background:
- Achieving ultra-high resolution patterns is crucial for advanced microelectronic and photonic devices.
- Inkjet printing offers precise material deposition but faces challenges in controlling thin film morphology during drying.
- Sublimation transfer is a common technique for pattern fabrication, but porous surfaces can degrade performance.
Purpose of the Study:
- To develop an ultra-high resolution pattern fabrication method using inkjet printing and sublimation transfer.
- To investigate and control the morphology of inkjet-printed films during the drying process.
- To achieve void-free, high-resolution patterns with improved surface characteristics.
Main Methods:
- Utilized inkjet printing with a co-solvent ink (N,N-dimethylformamide/ortho-dichlrorobenzene) optimized for Ohnesorge-Reynolds numbers.
- Investigated inkjet printing parameters like drop and line spacing for 2822 PPI microchannels.
- Employed a vacuum drying process to control film morphology, contrasting with air drying methods.
- Grafted vacuum drying onto a sublimation transfer process for pattern fabrication.
Main Results:
- Successfully fabricated line patterns with 2822 PPI resolution.
- Achieved ultra-high resolution patterns with a root-mean-square (RMS) roughness of 1.331 nm.
- Demonstrated void-free pattern fabrication by controlling film morphology via vacuum drying.
- Overcame the issue of porous surfaces typically observed with air-dried sublimation patterns.
Conclusions:
- Vacuum drying is critical for controlling the morphology of inkjet-printed films in microchannels.
- The developed inkjet printing and vacuum drying process enables the fabrication of ultra-high resolution, void-free patterns.
- This technique offers a promising route for producing high-performance microscale devices requiring precise pattern features.

