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Photocleavable Triblock Copolymers Featuring an Activated Ester Middle Block: "One-Step" Synthesis and Application as
Hui Zhao1, Weiyin Gu2, Ryohei Kakuchi1
1Institute for Technical and Macromolecular Chemistry, University of Hamburg, Bundesstr.45, 20146 Hamburg, Germany.
Abstract:
Polystyrene-block-poly(maleimide pentafluorophenyl ester-co-styrene)-block-poly(ethylene oxide) with an o-nitrobenzyl ester junction was synthesized by "one-step" RAFT polymerization. Highly ordered and locally reactive nanoporous thin films were obtained from the photocleavable triblock copolymer after spin coating, solvent annealing, UV exposure, and washing with methanol/water to remove the minor block PEO. The local reactivity in the thin films was demonstrated by fabrication of iron oxide nanotori after post-modification with an amino-functionalized ferrocene and treatment with oxygen plasma.
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