One-Step Production of Anisotropically Etched Graphene Using Supercritical Water

We developed a one-step method for production of anisotropically etched graphene using supercritical fluid (SCF). Anisotropic etching of a graphite substrate and dispersed graphite powder with Ag nanoparticles was conducted in supercritical water (SCW). Because of the exfoliation effect of SCF, graphene was isolated from the graphite simultaneously with the anisotropic etching. High-resolution transmission electron microscopy (HRTEM) and Raman spectroscopy revealed the production of multilayer graphene exfoliated from the anisotropically etched graphite surface.