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Related Experiment Video

Updated: Sep 8, 2025

A Microfluidic Approach for the Study of Ice and Clathrate Hydrate Crystallization

A Microfluidic Approach for the Study of Ice and Clathrate Hydrate Crystallization

Published on: August 18, 2022

Theoretical modeling of ice lithography on amorphous solid water.

Tao Liu¹, Xujie Tong¹, Shuoqiu Tian¹

¹Nanolithography and Application Research Group, State Key Laboratory of ASIC and System, School of Information Science and Technology, Fudan University, Shanghai 200433, China. yifangchen@fudan.edu.cn.

|June 15, 2022

Summary

This study introduces a Monte Carlo model for ice lithography (IL), a nanotechnology technique. The model accurately predicts ice resist profiles, offering insights into IL

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Last Updated: Sep 8, 2025

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Ice Generation and the Heat and Mass Transfer Phenomena of Introducing Water to a Cold Bath of Brine

Ice Generation and the Heat and Mass Transfer Phenomena of Introducing Water to a Cold Bath of Brine

Published on: March 13, 2017

Area of Science:

Nanotechnology and Nanoscience
Materials Science
Computational Physics

Background:

Ice lithography (IL) is an emerging nanotechnology technique derived from electron beam lithography (EBL).
IL offers advantages like in situ fabrication, high efficiency, accuracy, and 3D profiling.
Theoretical modeling for IL, particularly for amorphous solid water (ASW) resists, is underdeveloped, hindering progress.

Purpose of the Study:

To develop a theoretical model for ice lithography (IL) using Monte Carlo simulations.
To calculate replicated profiles on amorphous solid water (ASW) resists.
To provide a tool for understanding and advancing IL capabilities.

Main Methods:

Developed an e-beam induced etching ice model based on the Monte Carlo algorithm.
Utilized point/line spread functions to calculate resist profiles.
Performed systematic simulations varying resist thickness, electron voltage, and patterns.

Main Results:

The Monte Carlo model successfully calculates replicated profiles in ASW resists.
Simulations demonstrate IL's superior performance over conventional EBL on PMMA.
IL shows advantages in minimum feature size, aspect ratio, and 3D nanostructure fabrication.

Conclusions:

The developed model provides a powerful theoretical tool for characterizing ice lithography.
This work advances IL from an experimental technique to a theoretically understood process.
The findings pave the way for future developments in 3D nanostructure fabrication using IL.