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Updated: Sep 7, 2025

Bulk and Thin Film Synthesis of Compositionally Variant Entropy-stabilized Oxides
Published on: May 29, 2018
Tetravalent Doping in Fluorite-Based Ferroelectric Oxides for Reduced Voltage Operations
Kisung Chae1,2, Andrew C Kummel1, Kyeongjae Cho2
1University of California, San Diego, La Jolla, California 92093, United States.
Abstract:
First-principles calculations show a reduced energy barrier for polarization switching via a bulk phase transition by doping of hafnium-zirconium oxide (HZO). The tetragonal P42/nmc phase serves as a transition state for polarization switching of the polar orthorhombic Pca21 phase. Due to the high symmetry of the tetragonal phase, dopants can form more energetically favorable local oxygen bonding configurations in the tetragonal phase versus the orthorhombic phase. Significant bond strain is observed in the orthorhombic phase due to the low symmetry of the host crystal structure which decreases the relative stability of the doped orthorhombic phase compared to the doped tetragonal phase, thereby significantly lowering the barrier for switching but slightly affecting the polarization of the orthorhombic phase. Si is a promising dopant for an efficient ferroelectric device with minimal disturbance in the electronic structure parameters. Ge doping is suitable for stabilizing the tetragonal phase which shows a high k value.
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