A low-temperature thermal ALD process for nickel utilizing dichlorobis(triethylphosphine)nickel(II) and

Anton Vihervaara1, Timo Hatanpää1, Kenichiro Mizohata2

  • 1Department of Chemistry, University of Helsinki, P. O. Box 55, FI-00014 Helsinki, Finland. mikko.ritala@helsinki.fi.

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