Cuprous Oxide Thin Films Implanted with Chromium Ions-Optical and Physical Properties Studies
Katarzyna Ungeheuer1, Konstanty W Marszalek1, Marzena Mitura-Nowak2
1Faculty of Computer Science, Electronics and Telecommunications, AGH University of Science and Technology in Krakow, 30-059 Krakow, Poland.
International Journal of Molecular Sciences
|August 12, 2022
Summary
Chromium ion implantation into cuprous oxide (Cu2O) films did not alter the lattice constant but induced phase changes and altered optical properties. This modification impacts the material
Area of Science:
- Materials Science
- Nanotechnology
- Semiconductor Physics
Background:
- Cuprous oxide (Cu2O) is a semiconductor with applications in photocatalysis, sensors, and photovoltaics.
- Modifying Cu2O properties is crucial for enhancing its performance in these applications.
Purpose of the Study:
- To investigate the effects of chromium (Cr) ion implantation on the structural, optical, and surface properties of Cu2O thin films.
- To understand the relationship between Cr ion dosage and the observed property changes.
Main Methods:
- Deposition of Cu2O thin films using magnetron sputtering.
- Implantation of low-energy Cr ions at various dosages.
- Characterization using X-ray diffraction (XRD), spectrophotometry, spectroscopic ellipsometry, and atomic force microscopy (AFM).
Main Results:
- Cr ion implantation had minimal impact on the lattice constant, microstrain, and crystalline size of Cu2O.
- A phase change was observed in the implanted films.
- Ellipsometry revealed an increase in sample thickness with higher Cr ion doses, indicating surface and subsurface modification.
- Optical parameters (refractive index, extinction coefficient, absorption coefficient) exhibited energy-dependent variations related to the implantation dose.
Conclusions:
- Cr ion implantation can induce phase changes and modify optical properties of Cu2O thin films without significantly altering the lattice structure.
- The observed changes suggest that ion implantation is a viable method for tuning the optoelectronic properties of Cu2O for potential device applications.
