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Updated: Sep 1, 2025

Patterning via Optical Saturable Transitions - Fabrication and Characterization
Published on: December 11, 2014
Henning J Meteling1, Florian Bosse1, Lisa Schlichter1
1Center for Soft Nanoscience and Organic Chemistry Institute, Westfälische Wilhelms-Universität Münster, Busso-Peus-Str. 10, 48149, Münster, Germany.
Researchers developed a novel imprint lithography technique using photoswitches instead of polymer resists. This method allows for reversible surface patterning and has potential applications in nanotechnology and microfabrication.
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