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Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope

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Evolution in Lithography Techniques: Microlithography to Nanolithography.

Ekta Sharma¹, Reena Rathi¹, Jaya Misharwal¹

¹Deaprtment of Physics, Chaudhary Ranbir Singh University, Jind 126102, India.

Nanomaterials (Basel, Switzerland)

|August 26, 2022

Summary

This summary is machine-generated.

This review explores various lithographic techniques, including optical, extreme ultraviolet, electron beam, X-ray, and ion beam lithography, crucial for fabricating micro and nano-scale electronic devices.

Keywords:

alignment marks lithography mask nano-devices resist

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Area of Science:

Materials Science
Electrical Engineering
Nanotechnology

Background:

Electronic devices are integral to modern life, necessitating advanced fabrication techniques.
Device components like diodes, transistors, and ICs require precise substrate patterning via lithography.
Diverse sensors are developed for healthcare and lifestyle applications, relying on sophisticated chip manufacturing.

Purpose of the Study:

To review and analyze various lithographic techniques used in electronic device fabrication.
To discuss the historical evolution and applications of these lithography methods.
To explore advancements in exposure tools, resists, and patterning strategies for micro and nano-fabrication.

Main Methods:

Comprehensive literature review of lithographic techniques.
Analysis of optical lithography, extreme ultraviolet lithography, electron beam lithography, X-ray lithography, and ion beam lithography.
Discussion on mask and maskless lithography, exposure tools, and resist materials.

Main Results:

Detailed overview of different lithographic methods and their progression over time.
Examination of advancements in exposure tools for enhanced device resolution.
Comparison of chemically amplified and non-chemically amplified resists, along with mask/maskless techniques.

Conclusions:

Lithography is fundamental for micro and nano-scale device fabrication.
Continuous advancements in lithographic techniques are essential for future electronic devices.
Suggested improvements aim to enhance the performance and resolution of current lithography methods.