Non-ohmic Devices
Biasing of FET
Biasing of Metal-Semiconductor Junctions
Dielectric Polarization in a Capacitor
The Role of Ion Channels in Neuronal Computation
Insensitive Nuclei Enhanced by Polarization Transfer (INEPT)
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A Fabrication and Measurement Method for a Flexible Ferroelectric Element Based on Van Der Waals Heteroepitaxy
Published on: April 8, 2018
Thomas Mikolajick1,2, Min Hyuk Park3, Laura Begon-Lours4
1NaMLab gGmbH, Noethnitzer Strasse 64 a, 01187, Dresden, Germany.
Ferroelectric hafnium oxide enables low-power nonvolatile electronic devices and memory cells. This material is key for emerging applications like in-memory and neuromorphic computing systems.
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