Jove
Visualize
Contact Us
JoVE
x logofacebook logolinkedin logoyoutube logo
ABOUT JoVE
OverviewLeadershipBlogJoVE Help Center
AUTHORS
Publishing ProcessEditorial BoardScope & PoliciesPeer ReviewFAQSubmit
LIBRARIANS
TestimonialsSubscriptionsAccessResourcesLibrary Advisory BoardFAQ
RESEARCH
JoVE JournalMethods CollectionsJoVE Encyclopedia of ExperimentsArchive
EDUCATION
JoVE CoreJoVE BusinessJoVE Science EducationJoVE Lab ManualFaculty Resource CenterFaculty Site
Terms & Conditions of Use
Privacy Policy
Policies

Related Concept Videos

You might also read

Related Articles

Articles linked to this work by shared authors, journal, and citation graph.

Sort by
Same author

Tuning ferrimagnetism in Co<sub>1.5</sub>Fe<sub>1.5</sub>O<sub>4</sub> by Ag ion irradiation: a structural and X-ray magnetic circular dichroism study.

Physical chemistry chemical physics : PCCP·2026
Same author

Nanoscale Optical Inhomogeneities From Compositional Segregation Within Individual GaN-on-Si Quantum Wells.

Advanced science (Weinheim, Baden-Wurttemberg, Germany)·2026
Same author

Circumportal Pancreas During Pancreaticoduodenectomy: Radiologic Recognition and Surgical Considerations.

ANZ journal of surgery·2026
Same author

Combined resistive switching memory and multi-state operation in terpyridine-based Pd(II) and Fe(III) complexes for neuromorphic applications.

Nanoscale·2026
Same author

RNase Z from Deinococcus radiodurans couples tRNA processing with stress-responsive mRNA and sRNA turnover.

Biochemical and biophysical research communications·2026
Same author

Directed evolution of a thermostable laccase from Geobacillus stearothermophilus for efficient reduction of oxygen.

Biochimie·2026

Related Experiment Video

Updated: Aug 29, 2025

Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope
10:25

Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope

Published on: September 14, 2018

10.2K

Patterning at the Resolution Limit of Commercial Electron Beam Lithography.

Mohammad S M Saifullah1, Mohamed Asbahi2, Darren C J Neo3

  • 1Laboratory for Micro and Nanotechnology, Paul Scherrer Institute, 5232 Villigen PSI, Switzerland.

Nano Letters
|September 7, 2022
PubMed
Summary

Researchers developed a novel single-source precursor resist for electron beam lithography (EBL). This advanced resist achieves 4 nm resolution, matching the electron beam probe size for high-detail nanopatterning.

Keywords:
cadmium sulfideelectron beam lithographynanofabricationresistssingle-source precursorsxanthates

More Related Videos

Use of Sacrificial Nanoparticles to Remove the Effects of Shot-noise in Contact Holes Fabricated by E-beam Lithography
07:47

Use of Sacrificial Nanoparticles to Remove the Effects of Shot-noise in Contact Holes Fabricated by E-beam Lithography

Published on: February 12, 2017

7.3K
Electric-field Control of Electronic States in WS2 Nanodevices by Electrolyte Gating
10:36

Electric-field Control of Electronic States in WS2 Nanodevices by Electrolyte Gating

Published on: April 12, 2018

11.6K

Related Experiment Videos

Last Updated: Aug 29, 2025

Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope
10:25

Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope

Published on: September 14, 2018

10.2K
Use of Sacrificial Nanoparticles to Remove the Effects of Shot-noise in Contact Holes Fabricated by E-beam Lithography
07:47

Use of Sacrificial Nanoparticles to Remove the Effects of Shot-noise in Contact Holes Fabricated by E-beam Lithography

Published on: February 12, 2017

7.3K
Electric-field Control of Electronic States in WS2 Nanodevices by Electrolyte Gating
10:36

Electric-field Control of Electronic States in WS2 Nanodevices by Electrolyte Gating

Published on: April 12, 2018

11.6K

Area of Science:

  • Materials Science
  • Nanotechnology
  • Electron Beam Lithography

Background:

  • Low molecular weight resists offer high resolution potential in electron beam lithography (EBL).
  • Advances in resist materials have not kept pace with EBL system improvements.
  • Bridging the gap between resist capability and EBL system resolution is crucial for nanoscale fabrication.

Purpose of the Study:

  • To demonstrate a low-molecular-mass single-source precursor resist capable of high-resolution patterning.
  • To investigate the mechanism of radiolysis and material construction in the resist.
  • To explore the potential for angstrom-scale patterning using advanced resist formulations.

Main Methods:

  • Utilized a single-source precursor resist based on cadmium(II) ethylxanthate complexed with pyridine.
  • Employed electron beam lithography (EBL) to pattern the resist.
  • Analyzed the resolution achieved in relation to the electron beam probe diameter.

Main Results:

  • Achieved a resolution of 4 nm, closely matching the measured electron beam probe diameter of approximately 3.8 nm.
  • Demonstrated top-down radiolysis and bottom-up material construction driven by energetic electrons within the exposed resist volume.
  • Confirmed that patterned feature size is limited by the electron beam diameter.

Conclusions:

  • The developed single-source precursor resist enables high-resolution patterning in EBL.
  • The mechanism involves electron-induced radiolysis and bottom-up material assembly.
  • Angstrom-scale patterning of functional materials may be achievable with aberration-corrected EBL systems and optimized precursor resists.