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Atmospheric pressure atomic layer deposition to increase organic solvent resistance of PDMS
Albert Santoso1, Afke Damen1, J Ruud van Ommen1
1Department of Chemical Engineering, Delft University of Technology, Delft, The Netherlands. v.vansteijn@tudelft.nl.
Chemical Communications (Cambridge, England)
|September 8, 2022
Abstract:
We explore three variants of atomic layer deposition (ALD) to deposit titanium oxide on the soft polymer polydimethylsiloxane (PDMS). We show that the organic solvent resistance of PDMS is increased by two orders of magnitude compared to uncoated PDMS for ALD performed at atmospheric pressure, which results in a unique surface-subsurface coating of PDMS.
