Enhanced Stability and Catalytic Performance of Active Rh Sites on Al₂O₃ Via Atomic Layer Deposited ZrO₂

Modulating the Rh active sites on surfaces of Al₂O₃ is crucial to developing effective three-way catalysts. Herein, an ultralow amount of ZrO₂ (0.0179%) was deposited onto Al₂O₃ nanorods via atomic layer deposition (ALD) to form a catalyst with both thermal stability and low-temperature activity. The results demonstrate that the ALD-ZrO₂ is conducive to improve the catalytic activity of the Rh site and inhibit the formation of irreducible Rh species at high temperature. The obtained catalysts show satisfactory performance for a model NO-CO reaction even after thermal aging at 1050 °C. This strategy shows that a molecularly precise synthesis can lead to the robust promotion of Rh activity under low temperature and provide a promising path toward reducing the deactivation of catalysts at high temperature.