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Updated: Aug 28, 2025

Monolayer Contact Doping of Silicon Surfaces and Nanowires Using Organophosphorus Compounds
Published on: December 2, 2013
AC parallel local oxidation of silicon
Zahra Hemmatian1, Denis Gentili1, Marianna Barbalinardo1
1Istituto per lo Studio dei Materiali Nanostrutturati, Consiglio Nazionale delle Ricerche Via P. Gobetti 101 40129 Bologna Italy massimilliano.cavallini@cnr.it.
Abstract:
Here, we present a suitable advancement of parallel local oxidation nanolithography, demonstrating its feasibility in alternate current mode (AC-PLON). For demonstration, we fabricated model structures consisting of an array of parallel nanostripes of electrochemical SiO with a controlled roughness. Besides, we proved the repeatability of AC-PLON and its integrability with conventional parallel local oxidation nanolithography.
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