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Rapid aberration correction for diffractive X-ray optics by additive manufacturing.

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    We developed a refractive phase plate to correct aberrations in multilayer Laue lenses (MLL). This method enhances hard X-ray focusing for high-resolution microscopy, significantly improving performance at synchrotron radiation sources.

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    Area of Science:

    • Optics and Photonics
    • Materials Science
    • X-ray Science

    Background:

    • Diffraction-limited hard X-ray optics are crucial for advanced microscopy, especially with new ultra-low emittance synchrotron sources.
    • Multilayer Laue lenses (MLL) offer high numerical apertures (NA) but face manufacturing challenges impacting performance.
    • Aberrations in MLL optics limit achieving diffraction-limited performance for high NA X-ray lenses.

    Purpose of the Study:

    • To present a novel method for aberration correction in crossed multilayer Laue lenses (MLL).
    • To demonstrate the effectiveness of a tailor-made refractive phase plate for improving X-ray focusing.
    • To enhance the performance of hard X-ray optics for high-resolution microscopy applications.

    Main Methods:

    • Utilized at-wavelength metrology for precise optical characterization.
    • Employed a rapid prototyping approach for fabricating custom refractive phase plates.
    • Implemented the phase plate with a crossed pair of MLL optics to correct aberrations.

    Main Results:

    • Successfully corrected aberrations in a crossed MLL pair using a refractive phase plate.
    • Improved the Strehl ratio from 0.41(2) to 0.81(4) at a numerical aperture of 3.3 × 10-3.
    • Demonstrated a significant enhancement in diffraction-limited hard X-ray focusing capabilities.

    Conclusions:

    • The developed refractive phase plate effectively corrects aberrations in MLL optics.
    • This aberration-correction scheme is adaptable and crucial for achieving diffraction-limited performance.
    • The method provides a vital tool for advancing hard X-ray focusing and microscopy at next-generation synchrotron sources.