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Surface metrology by multiple-wavelength coherent modulation imaging.

Jianji Yi, Jiangtao Zhao, Bingyang Wang

|October 18, 2022

Summary

This summary is machine-generated.

Coherent modulation imaging (CMI) offers nanometer resolution for advanced manufacturing metrology. This technique captures fast dynamics with a snapshot, overcoming limitations of existing methods.

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Area of Science:

Optics and Metrology
Advanced Manufacturing

Background:

Advanced manufacturing demands 3D metrology with nanometer resolution and fast dynamic capture.
Existing techniques like off-axis holography and phase-shifting interferometry have limitations in snapshot ability and common-light-path setup.

Purpose of the Study:

To evaluate the suitability and performance of Coherent Modulation Imaging (CMI) for advanced metrology applications.
To assess CMI's capability in achieving nanometer spatial resolution and capturing fast dynamics.

Main Methods:

Experimental investigation of the Coherent Modulation Imaging (CMI) method using visible light.
Measurement of both transparent and reflective samples.
Utilizing the concept of synthetic wavelength for phase unwrapping.

Main Results:

CMI successfully retrieved separate wavefronts at different wavelengths from a single measurement.
The method achieved an enlarged measurement range free from phase wrapping.
Demonstrated suitability for both transparent and reflective samples.

Conclusions:

Coherent Modulation Imaging (CMI) meets the requirements for advanced metrology, including snapshot ability and common-light-path setup.
CMI can be implemented at any wavelength, offering flexibility.
CMI is a promising tool for advanced metrology, enhancing capabilities in manufacturing.